Target And Particle/Powder(靶材和颗粒/粉末)

WaferHome Can Manufacture The High Purity Target And Powder

高纯粉末,靶材,纳米粉 High-Purity Powder / Nano Powder /High-Purity Granule高纯粉末,靶材,纳米粉 High-Purity Powder / Nano Powder /High-Purity Granule 高纯粉末,靶材,纳米粉 High-Purity Powder / Nano Powder /High-Purity Granule

Specification for Target And Particle/Powder

                 
Material Size Dopant Dopant Concentration Remark        
Aluminum Target 100mm 150mm 200mm 300mm Customization            
Silicon Target 100mm 150mm 200mm 300mm Customization            
Au Target 100mm 150mm 200mm 300mm Customization            
Cu Target 100mm 150mm 200mm 300mm Customization            
MgO Powder 3mm*3mm/Customization Customization            
TeO2 Powder 3mm*3mm/Customization Customization            
TiO2 Powder 3mm*3mm/Customization Customization            
ZnO Powder 3mm*3mm/Customization Customization            
La(镧) Powder 3mm*3mm/Customization Customization            
Ce(铈) Powder 3mm*3mm/Customization Customization            
Pu(镨) Powder 3mm*3mm/Customization Customization            
SM(钐) Powder 3mm*3mm/Customization Customization            
Y( 钇) Powder 3mm*3mm/Customization Customization            
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